POD cleaner which is used in semiconductor process conveys POD for 200mm wafer on cleaning tray.This machine jets out DIW through shower nozzle to clean and uses hot CDA to dry.

Feature

• 1. Auto transfer by conveyor (Fully automatic system)
• 2. High efficiency cleaning uniformity & dry solution
• 3. Semi-standard
• 4. High throughput (Optimized cleaning process)

Application

• - Semiconductor Cleaning Process 200mm(8")