It is chemical mixing and supplying system for wafer cleaning, etching, and stripping process.

Feature

• 1. Very reliable, ultra-precision chemical mixing and supplying system (Patented)
•  - Flexible chemical mixing and concentration control depending on processes as well as applied patented ultra-precision chemical mixing technology
• 2. Well-aligned with main processing systems
•  - Customized configuration system also available to meet user and process requirement
• 3. Compatible with main process systems and additional options
•  - Available customized chemical supply system and programs according to user’s requirement
• 4. Convenient recipe setting
• 5. Applicable chemicals
•  - SC-1, DHF, DSP, BOE (LAL), H-IPA (High temperature IPA) etc.

Application

• - Full Semiconductor Processes
•  · CLEAN(PRE CLN, IMD CLN, Backside)
•  · ETCH(OXIDE ETCH)
•  · STRIP(ORGANIC STRIP)