It is a system that supplies hot DIW for cleaning silicon wafers used in the semiconductor manufacturing

process, and prevents impurity pollution through the application of a halogen lamp  and a quartz glass dual-structure,

non-contact heating method and shows high-clean, high-efficiency compact design DIW heating system.

Feature

• 1. Realization of high cleanliness and cross-contamination prevention through the application of high-shoe furnace materials
•   - Heating : Quartz Glass & Halogen Lamp
•   - Piping : Fluoropolymer application (PFA, PTFE, PVDF)
• 2. Diverse lineup
•   - 12L ~ 48L HDIW supply model
• 3. Hight heating efficiency 
• 4. Application of safety measures such as overtemperature, fire, leakage, instantaneous power outage, earthquake, etc.
• 5. SEMI standard, CE mark

Application

• - Semiconductor Wafer Rinse Process