It cleans substrate initially or before deposition in LCDprocess

Feature

• 1. Horizontal conveyor type
• 2. Minimize particle by EUV, disk & roll-brush, high pressure & twin fluid shower
• 3. Genesis control of fume, particle by non-contact magnetism conveyor system
• 4. Secure maintenance space by optimum design of plumbing area

Application

• - CF Cleaner, TF Cleaner, LTPS Cleaner(ELA, GI, SD)