사업영역
반도체
- FOUP Cleaner
- POD Cleaner
- Wet Station
- Chemical Delivery
Supply System - Metal Lift Off
- Cassette
& Magazine Cleaner
Wet Station
반도체 공정 중에 발생되는 여러 가지 오염 원인물을 각종 약액(HF, SC1, SC2) 등으로
Cleaning 및 Etching, Develop, Strip 작업을 할 수 있는 Wet Process의 대표적인 장치
Feature
- Customized bath configuration will be available based on customer requirement up to 13 chemical and rinse baths
- Up to 6 transfer robots can be configured to improve throughput
- Optimized chemical bath design, strict chemical control, high qualified dryer
- Wafer transfercassette stocker etc.
- No water mark using pressured marangoni drying technology
- Highest cleaning effect by applying optimized scheduler of process recipe
Application
- Semiconductor Wet Process
- Cleaning (Pre CLN, IMD CLN, Back side)
- Etching (Oxide Etch)
- Stripping (Organic Strip)
