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Wet Station

  • One of the critical process equipment for Semiconductor device manufacturing processes through chemical cleaning technology to remove contaminants and defects on wafer surface as well as chemical etching and photo resist stripping.
    Feature
  • 1. Customized bath configuration will be available based on customer requirement up to 13 chemical and rinse baths
  • 2. Up to 6 transfer robots can be configured to improve throughput
  • 3. Optimized chemical bath design, strict chemical control, high qualified dryer
  • 4. Wafer transfercassette stocker etc.
  • 5. No water mark using pressured marangoni drying technology
  • 6. Highest cleaning effect by applying optimized scheduler of process recipe
    Application
  • - Semiconductor Wet Process
    ·CLEAN(PRE CLN, IMD CLN, Backside)
    ·ETCH(OXIDE ETCH)
    ·STRIP(ORGANIC STRIP)